This item still needs to be validated !
ITEM METADATA RECORD
Title: NMOS and PMOS triple gate devices with mid-gap metal gate on oxynitride and Hf based gate dielectrics
Authors: Henson, Kirklen ×
Collaert, Nadine
Demand, Marc
Goodwin, Michael
Brus, Stephan
Rooyackers, Rita
Van Ammel, Annemie
Degroote, Bart
Ercken, Monique
Baerts, Christina
Kottantharayil, Anil
Dixit, Abhisek
Beckx, Stephan
Schram, Tom
Deweerd, Wim
Boullart, Werner
Schaekers, Marc
De Gendt, Stefan
De Meyer, Christina
Yim, Yong Sik
Hooker, Jacob
Jurczak, Malgorzata
Biesemans, Serge #
Issue Date: 2005
Publisher: IEEE
Host Document: pages:136-137
Conference: Proceedings IEEE VLSI-TSA International Symposium on VLSI Technology location:Leuven Belgium date:25/04/05
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Electrical Engineering - miscellaneous
Molecular Design and Synthesis
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy

 




All items in Lirias are protected by copyright, with all rights reserved.

© Web of science