Title: The IMEC-Clean: A clean for advanced CMOS manufacturing
Authors: Meuris, Marc
Arnauts, Sophia
Cornelissen, Ingrid
Kenis, Karine
Lux, Marcel
De Gendt, Stefan
Mertens, Paul
Teerlinck, Ivo
Vos, Rita
Loewenstein, Lee
Heyns, Marc
Wolke, K
Issue Date: 2000
Conference: 7th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal; 19-21 June 2000; Newark, NJ, USA. location:Leuven Belgium
Publication status: published
KU Leuven publication type: DI
Appears in Collections:Clinical Residents Medicine

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.