Low-k a-SiCO:H films as diffusion barriers for advanced interconnects

Van Besien, Els; Singh, Arjun; Barbarin, Yohan; Verdonck, Patrick; Dekkers, Harold; Vanstreels, Kris; de Marneffe, Jean-Francois; Baklanov, Mikhaïl; Van Elshocht, Sven

doi:10.1016/j.mee.2013.12.022

Low-k a-SiCO:H films as diffusion barriers for advanced interconnects

Author:

Van Besien, Els

Singh, Arjun ; Barbarin, Yohan ; Verdonck, Patrick ; Dekkers, Harold ; Vanstreels, Kris ; de Marneffe, Jean-Francois ; Baklanov, Mikhaïl ; Van Elshocht, Sven

Keywords:

Science & Technology, Technology, Physical Sciences, Engineering, Electrical & Electronic, Nanoscience & Nanotechnology, Optics, Physics, Applied, Engineering, Science & Technology - Other Topics, Physics, SiCO, Low-k, Copper barrier, TDDB, Moisture barrier, Copper interconnects, PECVD, 0204 Condensed Matter Physics, 0299 Other Physical Sciences, 0906 Electrical and Electronic Engineering, Applied Physics, 4009 Electronics, sensors and digital hardware, 4016 Materials engineering