Photomask Technology Conference, Date: 2022/09/26 - 2022/09/29, Location: CA, Monterey
Publication date:
2022-01-01
Volume:
12293
DOI:
10.1117/12.2645402
Publisher:
Society of Photo-optical Instrumentation Engineers
PHOTOMASK TECHNOLOGY 2022
Author:
Dey, Bappaditya
Dehaerne, Enrique ; Halder, Sandip ; Kasprowicz, BS
Keywords:
Science & Technology, Physical Sciences, Optics, CD-SEM, defect inspection, supervised learning, deep learning, metrology, lithography, stochastic defects, defect classification, defect localization, yolov5, ensemble, 4006 Communications engineering, 4009 Electronics, sensors and digital hardware, 5102 Atomic, molecular and optical physics