Integration of a composite SiO2HfO2 interpoly dielectric layer for low voltage polypoly erase in a 0.18µm HIMOSTM memory cell
Publication date:
2004-01-01
Author:
Blomme, Pieter
Haspeslagh, Luc ; De Vos, Joeri ; Lorenzini, Martino ; Van Houdt, Jan ; De Meyer, Christina