Recent Progress in Advanced In-line Metrology For High-Mobility Semiconductors

Frontiers of Characterization and Metrology for Nanoelectronics - FCMN, Date: 2015/01/01 - 2015/01/04, Location: Dresden Germany

Publication date: 2015-01-01

Frontiers of Characterization and Metrology for Nanoelectronics - FCMN

Recent Progress in Advanced In-line Metrology For High-Mobility Semiconductors

Author:

Schulze, Andreas

Loo, Roger ; Meersschaut, Johan ; van Dorp, Dennis ; Gachet, David ; Berney, Jean ; Vandervorst, Wilfried ; Caymax, Matty