Line edge and width roughness mitigation at 22nm half pitch: plasma polymer interaction and roughness mitigation through etch

Plasma Etch and Strip in Microtechnology - PESM, Date: 2013/01/14 - 2013/01/03, Location: Leuven Belgium

Publication date: 2013-01-01

De Schepper, Peter

Hansen, Terje ; Vaglio Pret, Alessandro ; Altamirano Sanchez, Efrain ; Boullart, Werner ; De Gendt, Stefan