Thermal Annealing of Graphene Implanted with Mn at Ultralow Energies: From Disordered and Contaminated to Nearly Pristine Graphene

Lin, Pin-Cheng; Villarreal, Renan; Bana, Harsh; Zarkua, Zviadi; Hendriks, Vince; Tsai, Hung-Chieh; Auge, Manuel; Junge, Felix; Hofsaess, Hans; Tosi, Ezequiel; Lacovig, Paolo; Lizzit, Silvano; Zhao, Wenjuan; Di Santo, Giovanni; Petaccia, Luca; De Feyter, Steven; De Gendt, Stefan; Brems, Steven; Pereira, Lino MC

doi:10.1021/acs.jpcc.2c00855

Thermal Annealing of Graphene Implanted with Mn at Ultralow Energies: From Disordered and Contaminated to Nearly Pristine Graphene

Author:

Lin, Pin-Cheng

Villarreal, Renan ; Bana, Harsh ; Zarkua, Zviadi ; Hendriks, Vince ; Tsai, Hung-Chieh ; Auge, Manuel ; Junge, Felix ; Hofsaess, Hans ; Tosi, Ezequiel ; Lacovig, Paolo ; Lizzit, Silvano ; Zhao, Wenjuan ; Di Santo, Giovanni ; Petaccia, Luca ; De Feyter, Steven ; De Gendt, Stefan ; Brems, Steven ; Pereira, Lino MC

Keywords:

Science & Technology, Physical Sciences, Technology, Chemistry, Physical, Nanoscience & Nanotechnology, Materials Science, Multidisciplinary, Chemistry, Science & Technology - Other Topics, Materials Science, SINGLE-LAYER GRAPHENE, ION-IMPLANTATION, ELECTRONIC-STRUCTURE, CU(111), GROWTH, OXIDATION, FILMS, XPS, CU, G0A5921N#56128785, 03 Chemical Sciences, 09 Engineering, 10 Technology, Physical Chemistry, 34 Chemical sciences, 40 Engineering