ITEM METADATA RECORD
Title: On the quantitative characterization of strain distributions at thin-film edges
Authors: Janssens, Kgf ×
Vanhellemont, J
Maes, E
Van der Biest, Omer #
Issue Date: 1993
Publisher: Iop publishing ltd
Series Title: Microscopy of semiconducting materials 1993 issue:134 pages:225-228
Abstract: The characterization of submicrometer local stress fields is becoming of increasing importance in integrated circuit technologies. The only techniques which have the capabilities to study stress fields with micrometer to nanometer resolution are electron diffraction contrast imaging (EDCI) and convergent beam electron diffraction. In the present paper some calculated EDCImages of stress concentrations at thin film edges are shown to explore the possibilities of the technique.
ISSN: 0951-3248
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Physical Metallurgy and Materials Engineering Section (-)
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy

 




All items in Lirias are protected by copyright, with all rights reserved.

© Web of science