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Title: Simcon - a versatile software package for the simulation of electron-diffraction contrast images of arbitrary displacement-fields
Authors: Janssens, Kgf ×
Vanhellemont, J
Degraef, M
Van der Biest, Omer #
Issue Date: Nov-1992
Publisher: Elsevier science bv
Series Title: Ultramicroscopy vol:45 issue:3-4 pages:323-335
Abstract: A versatile modular program (SIMCON) for the simulation of electron diffraction contrast images of localized displacement fields resulting from elastic stress concentrations on a submicron scale has been developed. A first module computes the displacement field. Analytical as well as finite-element calculations with existing software are possible. The second module calculates the contrast image based on full two-beam dynamical diffraction theory using the displacement field as computed by the first. The third module can be used to perform image-analysis operations on the calculated intensity distribution and subsequently viewing the result on a computer screen or making hard copies on a PostScript printer. We present some examples of simulations under two-beam diffraction conditions illustrating the power of SIMCON.
URI: 
ISSN: 0304-3991
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Physical Metallurgy and Materials Engineering Section (-)
× corresponding author
# (joint) last author

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