ITEM METADATA RECORD
Title: Efficient silicon-on-insulator fiber coupler fabricated using 248-nm-deep UV lithography
Authors: Roelkens, G ×
Dumon, P
Bogaerts, Walter
Van Thourhout, D
Baets, R #
Issue Date: Dec-2005
Publisher: Ieee-inst electrical electronics engineers inc
Series Title: IEEE Photonics Technology Letters vol:17 issue:12 pages:2613-2615
Abstract: We present a silicon-on-insulator (SOI) waveguide to fiber coupler fabricated using 248-nm-deep ultraviolet lithography. The loss of the taper structure is around 1 dB while the coupling loss from a lensed fiber into a 590-nm-wide SOI waveguide was measured to be 1.9 dB.
URI: 
ISSN: 1041-1135
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Centre for Nuclear Engineering
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy

 




All items in Lirias are protected by copyright, with all rights reserved.

© Web of science