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Title: Nanophotonic waveguides in silicon-on-insulator fabricated with CMOS technology
Authors: Bogaerts, Walter ×
Baets, R
Dumon, P
Wiaux, V
Beckx, S
Taillaert, D
Luyssaert, B
Van Campenhout, J
Bienstman, P
Van Thourhout, D #
Issue Date: Jan-2005
Publisher: Ieee-inst electrical electronics engineers inc
Series Title: Journal of lightwave technology vol:23 issue:1 pages:401-412
Abstract: High-index-contrast, wavelength-scale structures are key to ultracompact integration of photonic integrated circuits. The fabrication of these nanophotonic structures in silicon-on-insulator using complementary metal-oxide-seminconductor processing techniques, including deep ultraviolet lithography, was studied. It is concluded that this technology is capable of commercially manufacturing nanophotonic integrated circuits. The possibilities of photonic wires and photonic-crystal waveguides for photonic integration are compared. It is shown that, with similar fabrication techniques, photonic wires perform at least an order of magnitude better than photonic-crystal waveguides with respect to propagation losses. Measurements indicate propagation losses as low as 0.24 dB/mm for photonic wires but 7.5 dB/mm for photonic-crystal waveguides.
URI: 
ISSN: 0733-8724
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Centre for Nuclear Engineering
× corresponding author
# (joint) last author

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