Title: Megasonic, non-contact cleaning followed by 'Rotagoni' drying of CMP wafers
Authors: Lauerhaas, J.
Mertens, P.W.
Nicolosi, T.
Kenis, Karine
Fyen, Wim
Heyns, Marc #
Issue Date: 2001
Publisher: Scitec publications ltd
Series Title: Ultra clean processing of silicon surfaces 2000 vol:76-77 pages:251-254
Abstract: A single wafer, megasonic-based non-contact Goldfinger cleaning tool equipped with a new drying technology based on the Marangoni principle [1-8] has been developed. The utility of noncontact cleaning is enhanced with the new drying technique.
ISSN: 1012-0394
Publication status: published
KU Leuven publication type: IT
Appears in Collections:TTO Association
Department of Materials Engineering - miscellaneous
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.

© Web of science