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Title: Procedure to evaluate particle-substrate interaction during immersion in liquid
Authors: Fyen, Wim ×
Van Steenbergen, J.
Xu, K.D.
Vos, R.
Mertens, P.
Heyns, Marc #
Issue Date: 2003
Publisher: Trans tech publications ltd
Series Title: Ultra clean processing of silicon surfaces v vol:92 pages:53-56
Abstract: In this paper we present a simple technique that can be used to evaluate whether a sub Micron particle will deposit on an wafer surface that is immersed in a given liquid. It is based on measuring the particle surface concentration as function of immersion time. Two contributions must be distinguished: one from adsorption during the immersion step, and a second one by residue formation when liquid evaporates during the drying step. By comparing the experimental results with theoretical models for both contributions, information on the particle-substrate interaction can be extracted. This technique will first be demonstrated using small wafer pieces and subsequently with 200mm wafers using standard metrology and equipment.
ISSN: 1012-0394
Publication status: published
KU Leuven publication type: IT
Appears in Collections:TTO Association
Clinical Residents Medicine
Department of Materials Engineering - miscellaneous
× corresponding author
# (joint) last author

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