Title: Advanced characterization - an indispensable tool for understanding ultra clean processing
Authors: Vandervorst, Wilfried ×
Bender, Hugo
Storm, Wolfgang
Heyns, Marc
Polleunis, C
Bertrand, P #
Issue Date: Jun-1995
Publisher: Elsevier science bv
Series Title: Microelectronic Engineering vol:28 issue:1-4 pages:27-34
Abstract: Economical and environmental considerations have led to the replacement of Ultra Clean Processing by the ''Just-Clean-Enough'' concept which is based on a fundamental understanding of the effect of contaminants and consequently on defining tolerable limits for the contamination. In this paper an overview is given of the characterisation tools which can be used in this context for metal detection, surface chemistry and roughening and organic contamination.
ISSN: 0167-9317
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Department of Materials Engineering - miscellaneous
Nuclear and Radiation Physics Section
× corresponding author
# (joint) last author

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