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Title: Comparison between cosi2 and tisi2 as dopant source for shallow silicided junction formation
Authors: Van den hove, Luc ×
Maex, Karen
Hobbs, L
Lippens, P
De Keersmaecker, Roger
Probst, V
Schaber, H #
Issue Date: Sep-1989
Publisher: Elsevier science bv
Series Title: Applied surface science vol:38 issue:1-4 pages:430-440
ISSN: 0169-4332
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Electrical Engineering - miscellaneous
Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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