Title: The kinetics of silicide formation using rapid thermal-processing and related silicon defect behavior
Authors: Maex, Karen ×
De Keersmaecker, Roger
Claeys, Corneel
Vanhellemont, J
Alkemade, P #
Issue Date: Mar-1986
Publisher: Electrochemical soc inc
Host Document: Journal of the electrochemical society vol:133 issue:3 pages:C101-C101
ISSN: 0013-4651
Publication status: published
KU Leuven publication type: IMa
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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