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Title: ISS-study of dopant redistribution in TiSi2 layers during silicidation by rapid thermal-processing
Authors: Tollet, H
Bielen, P
Creemers, Claude
Van Hove, H
Neyens, A
Maex, Karen
Dekeersmaecker, R #
Issue Date: Jul-1986
Publisher: John wiley & sons ltd
Host Document: Surface and interface analysis vol:9 issue:1-6 pages:338-339
Conference: ECASIA edition:85 location:Veldhoven (The Netherlands) date:14-18 October 1985
ISSN: 0142-2421
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Process Engineering for Sustainable Systems Section
Associated Section of ESAT - INSYS, Integrated Systems
# (joint) last author

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