Title: Rapid thermal-processing for simultaneous annealing of shallow implanted junctions and formation of their tisi2 contacts
Authors: Maex, Karen ×
Dekeersmaecker, Rf #
Issue Date: 1985
Publisher: Elsevier science bv
Series Title: Physica b & c vol:129 issue:1-3 pages:192-196
ISSN: 0378-4371
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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