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Title: Evaluation of post metal etch cleaning by analyzing the chemical compositions and distributions on the etched Al surface
Authors: Li, H ×
Baklanov, Mikhail
Boullart, W
Conard, T
Brijs, B
Vandervorst, Wilfried
Maex, Karen
Froyen, Ludo #
Issue Date: 1999
Publisher: Trans tech-scitec publications ltd
Series Title: Solid state phenomena vol:65-6 pages:177-180
Abstract: The post metal etch strip process in downstream H2O-based plasma followed by a wet chemistry has been evaluated. Results on the evolusion of surface compositions and species during each cleaning step are presented. It is argued that the formation and subsequently the removal of the surface layer by the cleaning process plays a critical role in reducing the chlorine concentration.
ISSN: 1012-0394
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Nuclear and Radiation Physics Section
Physical Metallurgy and Materials Engineering Section (-)
Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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