Title: A quantitative model for silicon yield stress calculations at thin-film edges
Authors: Vanhellemont, J ×
Claeys, Corneel #
Issue Date: Jun-1988
Publisher: Electrochemical soc inc
Series Title: Journal of the electrochemical society vol:135 issue:6 pages:1509-1517
ISSN: 0013-4651
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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