Title: Silicides for integrated-circuits - tisi2 and cosi2
Authors: Maex, Karen # ×
Issue Date: Nov-1993
Publisher: Elsevier science sa lausanne
Series Title: Materials science & engineering r-reports vol:11 issue:2-3 pages:53-153
Abstract: Silicides have been a topic of intensive research for more than a decade.The driving force for these investigations has certainly been the interesting materials aspects of the silicides and their applications in integrated circuits. The advantages of easy formability and low resistivity for both CoSi2 and TiSi2 have led to an intensive use of these silicides in self-aligned processes for simultaneous silicidation of source, drain and gate.
ISSN: 0927-796X
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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