Title: Simultaneous formation of contacts and diffusion-barriers for vlsi by rapid thermal silicidation of tiw
Authors: Norstrom, H ×
Maex, Karen
Vanhellemont, J
Brijs, G
Vandervorst, Wilfried
Smith, U #
Issue Date: Dec-1990
Publisher: Springer verlag
Series Title: Applied physics a-materials science & processing vol:51 issue:6 pages:459-466
ISSN: 0947-8396
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Nuclear and Radiation Physics Section
Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.

© Web of science