Title: Rapid thermal-processing and thin-film technologies
Authors: Maex, Karen # ×
Issue Date: Oct-1991
Publisher: Elsevier science bv
Series Title: Microelectronic Engineering vol:15 issue:1-4 pages:467-474
Abstract: Over the last few years, there is an increasing interest in Rapid Thermal Processing for many applications in Si technology. Major issues like temperature control and uniformity as well as gas control have been improved. Moreover, with the introduction of single wafer cluster tools, rapid thermal processes become more important in various technological steps.
ISSN: 0167-9317
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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