Title: Modeling of rapid thermal-processing
Authors: Vanden Abeele, P
Maex, Karen #
Issue Date: Feb-1991
Publisher: Elsevier science bv
Series Title: Microelectronic Engineering vol:10 issue:3-4 pages:207-216
Abstract: An overview is given of modelling issues in rapid thermal processing. Firstly, the influence of surface and bulk properties on wafer emissivity is discussed. Secondly, the influence of back-side layers, wafer transparency and back-side roughness on temperature measurement is discussed. Thirdly, several causes of temperature non-uniformity are mentioned.
ISSN: 0167-9317
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
# (joint) last author

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