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Title: An in-depth study of the influence of silylation conditions on the silicon contrast
Authors: Goethals, Am ×
Lombaerts, Rita
Roland, B
Van den hove, Luc #
Issue Date: Mar-1991
Publisher: Elsevier science bv
Series Title: Microelectronic Engineering vol:13 issue:1-4 pages:37-40
Abstract: The final lithographic performance of the Desire process is mainly determined by the selectivity of Si incorporation during the silylation step. The influence of the silylation conditions on both the Si contrast and the silylation kinetics have been studied. The silylation process has been optimized with a response surface analysis. The application of these optimum conditions has resulted in a wide process window.
URI: 
ISSN: 0167-9317
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Electrical Engineering - miscellaneous
Laboratory of Pediatric Immunology
× corresponding author
# (joint) last author

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