This item still needs to be validated !
Title: Wet and dry etching experience for sensor micromachining
Authors: Puers, Robert ×
Peeters, E
Sansen, Willy #
Issue Date: Mar-1991
Publisher: Elsevier science bv
Series Title: Microelectronic Engineering vol:13 issue:1-4 pages:443-446
Abstract: The use of silicon as a material for mechanical sensor applications necessitates the availability of micromachining tools, which are not common to standard IC fabrication lines. This paper summerises different etching techniques for the realization of miniature mechanical structures in silicon. These include wet anisotropic etchants and dry, plasma-assisted etching facilities.
ISSN: 0167-9317
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Electrical Engineering - miscellaneous
ESAT - MICAS, Microelectronics and Sensors
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.

© Web of science