This item still needs to be validated !
Title: Correlation between stress and film-edge induced defect generation for tisi2 and cosi2 formed by metal-si reaction
Authors: Van den hove, Luc
Vanhellemont, J
Wolters, R
Claasen, W
De Keersmaecker, Roger
Declerck, Gilbert
Issue Date: Mar-1988
Publisher: Electrochemical soc inc
Host Document: Journal of the electrochemical society vol:135 issue:3 pages:C134-C134
Conference: - location:- date:-
ISSN: 0013-4651
Publication status: published
KU Leuven publication type: IMa
Appears in Collections:Electrical Engineering - miscellaneous
Associated Section of ESAT - INSYS, Integrated Systems

Files in This Item:

There are no files associated with this item.


All items in Lirias are protected by copyright, with all rights reserved.