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Title: In situ emissivity measurements to probe the phase-transformations during rapid thermal-processing co silicidation
Authors: Schreutelkamp, Rj ×
Vanden Abeele, Pierre
Deweerdt, B
Coppye, W
Vermeiren, C
Lauwers, A
Maex, Karen #
Issue Date: Nov-1992
Publisher: Amer inst physics
Series Title: Applied Physics Letters vol:61 issue:19 pages:2296-2298
Abstract: Phase transformations during RTP Co silicidation on both crystalline and polycrystalline silicon have been monitored for the first time by in situ emissivity measurements at a wavelength of 2.4 mum. The method can be used to accurately control the silicidation process and the final silicide phase. It is demonstrated that factors influencing silicidation, such as background doping level and the degree of crystallinity of the substrate can be determined. Ex situ emissivity measurements as a function of wavelength show that an analyzing wavelength of 10 mum can be applied to further improve the probing sensitivity for all silicide phase transformations.
URI: 
ISSN: 0003-6951
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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