|ITEM METADATA RECORD
|Title: ||Highly scalable ALD-deposited hafnium silicate gate stacks for low standby power applications|
|Authors: ||Swerts, Johan|
De Gendt, Stefan
Wilk, G #
|Issue Date: ||2006 |
|Host Document: ||pages:0917-E11-04|
|Conference: ||Gate Stack Scaling - Materials Selection, Role of Interfaces, and Reliability Implications location:Leuven Belgium date:17/04/06|
|Publication status: ||published|
|KU Leuven publication type: ||IC|
|Appears in Collections:||Molecular Design and Synthesis|
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