Title: Highly scalable ALD-deposited hafnium silicate gate stacks for low standby power applications
Authors: Swerts, Johan
Deweerd, Wim
Wang, C.G
Fedorenko, Yanina
Delabie, Annelies
Shero, E
Zhao, Chao
Maes, J
De Gendt, Stefan
Wilk, G #
Issue Date: 2006
Publisher: MRS
Host Document: pages:0917-E11-04
Conference: Gate Stack Scaling - Materials Selection, Role of Interfaces, and Reliability Implications location:Leuven Belgium date:17/04/06
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Molecular Design and Synthesis
# (joint) last author

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