Title: ALD vs. MOCVD for high-k deposition in 45nm CMOS and below
Authors: Deweerd, Wim ×
Delabie, Annelies
Van Elshocht, Sven
De Gendt, Stefan
Caymax, Matty
Heyns, Marc #
Issue Date: 2006
Series Title: Future Fab vol:20 pages:93-93
ISSN: 1363-5182
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Molecular Design and Synthesis
Department of Materials Engineering - miscellaneous
× corresponding author
# (joint) last author

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