Title: Cluster formation during annealing of ultra-low-energy boron-implanted silicon
Authors: Collart, E. J. H ×
Murrell, A. J
Foad, M. A
van den Berg, J. A
Zhang, S
Armour, D
Goldberg, R. D
Wang, T. S
Cullis, A. G
Clarysse, Trudo
Vandervorst, Wilfried #
Issue Date: 2000
Series Title: Journal of Vacuum Science & Technology B, Microelectronics and Nanometer Structures vol:B18 issue:1 pages:435-439
ISSN: 1071-1023
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Electrical Engineering - miscellaneous
× corresponding author
# (joint) last author

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