Title: Single wafer CVD of silicon nitride for CMOS gate applications
Authors: Pomarede, C ×
Werkhoven, Chris
Weidmann, J
Bergman, T
Gschwandtner, A
Houssa, Michel #
Issue Date: 1999
Host Document: pages:147-154
Conference: Ultrathin SiO2 High-K Materials for ULSI Gate Dielectrics; 5-9 April 1999; San Francisco, Ca, USA.
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Semiconductor Physics Section
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.

© Web of science