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Title: The role of TXRF in the introduction of high-k materials into IC processing
Authors: Hellin, David ×
Onsia, Bart
Delabie, Annelies
De Gendt, Stefan
Vinckier, Christiaan #
Issue Date: 2004
Publisher: ECS
Host Document: Physics and Technology of High-k Gate Dielectrics pages:199-211
Conference: Physics and Technology of High-k Gate Dielectrics II location:Orlando, US date:12-16 October 2003
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Molecular Design and Synthesis
× corresponding author
# (joint) last author

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