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Title: Co-implantation for 45 nm PMOS and NMOS source-drain extension formation: device characterisation down to 30 nm physical gate length
Authors: Collart, Erik ×
Pawlak, Bartek
Duffy, Ray
Augendre, Emmanuel
Severi, Simone
Janssens, Tom
Absil, Philippe
Vandervorst, Wilfried
Felch, Susan
Schreutelkamp, Rob
Cowern, Nick #
Issue Date: 2006
Publisher: AIP
Host Document: pages:37-40
Conference: Ion Implantation Technology: 16th International Conference - IIT location:Horsham UK date:11/06/06
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
Electrical Engineering - miscellaneous
× corresponding author
# (joint) last author

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