This item still needs to be validated !
ITEM METADATA RECORD
Title: Co-implantation for 45 nm PMOS and NMOS source-drain extension formation: device characterisation down to 30 nm physical gate length
Authors: Collart, Erik ×
Pawlak, Bartek
Duffy, Ray
Augendre, Emmanuel
Severi, Simone
Janssens, Tom
Absil, Philippe
Vandervorst, Wilfried
Felch, Susan
Schreutelkamp, Rob
Cowern, Nick #
Issue Date: 2006
Publisher: AIP
Host Document: pages:37-40
Conference: Ion Implantation Technology: 16th International Conference - IIT location:Horsham UK date:11/06/06
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
Electrical Engineering - miscellaneous
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy

 




All items in Lirias are protected by copyright, with all rights reserved.