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|ITEM METADATA RECORD
|Title: ||Co-implantation for 45 nm PMOS and NMOS source-drain extension formation: device characterisation down to 30 nm physical gate length|
|Authors: ||Collart, Erik ×|
Cowern, Nick #
|Issue Date: ||2006 |
|Host Document: ||pages:37-40|
|Conference: ||Ion Implantation Technology: 16th International Conference - IIT location:Horsham UK date:11/06/06|
|Publication status: ||published|
|KU Leuven publication type: ||IC|
|Appears in Collections:||Associated Section of ESAT - INSYS, Integrated Systems|
Electrical Engineering - miscellaneous
× corresponding author|
# (joint) last author|
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