This item still needs to be validated !
ITEM METADATA RECORD
Title: Influence of the As and BF2 junction implantation on the stress induced defects during the Ti- and Co/Ti-silicidation
Authors: Steegen, An
Bender, Hugo
De Wolf, Ingrid
Maex, Karen #
Issue Date: 1999
Host Document: pages:15-22
Conference: Advanced Interconnects and Contacts; MRS Spring Meeting 1999; April 1999; San Francisco, CA, USA.
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
Electrical Engineering - miscellaneous
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy

 




All items in Lirias are protected by copyright, with all rights reserved.

© Web of science