Title: Impact of fluorine co-implant on boron diffusion during non-melt laser annealing
Authors: Noda, Taiji ×
Felch, Susan
Parihar, V
Vrancken, Christa
Janssens, Tom
Bender, Hugo
Van Daele, Benny
Vandervorst, Wilfried #
Issue Date: 2006
Publisher: AIP
Host Document: pages:21-24
Conference: Ion Implantation Technology: 16th International Conference location:Leuven Belgium date:11/06/06
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Electrical Engineering - miscellaneous
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.