|ITEM METADATA RECORD
|Title: ||Modeling and experiments of boron diffusing during sub-millisecond non-melt laser annealing in silicon|
|Authors: ||Noda, Taiji ×|
Vandervorst, Wilfried #
|Issue Date: ||2006 |
|Host Document: ||pages:C05-06|
|Conference: ||Doping Engineering for Device Fabrication Doping Engineering for Device Fabrication Doping Engineering for Device Fabrication location:Leuven Belgium date:17/04/06|
|Publication status: ||published|
|KU Leuven publication type: ||IC|
|Appears in Collections:||Electrical Engineering - miscellaneous|
× corresponding author|
# (joint) last author|
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