Title: Dry etch process development for FLARE(tm) for dual damascene architecture using a N2/O2 plasma
Authors: Thompson, Heike
Vanhaelemeersch, Serge
Maex, Karen
Van Ammel, Annemie
Beyer, Gerald
Coenegrachts, Bart
Vervoort, Iwan
Waeterloos, Joost
Struyf, Herbert
Palmans, Roger
Forester, Lynn #
Issue Date: 1999
Conference: Proceedings of the International Interconnect Technology Conference - IITC; San Francisco, CA, USA.
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
# (joint) last author

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