Title: Ultra-shallow junction process development for the 45nm CMOS technology node using co-implantation
Authors: Collart, E.J.H
Kirkwood, D
Lindsay, Richard
Vandervorst, Wilfried
Pawlak, Bartek
Issue Date: 2004
Conference: 15th International Conference on Ion Implantation Technology date:24/10/04
Publication status: published
KU Leuven publication type: DI
Appears in Collections:Electrical Engineering - miscellaneous

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