|ITEM METADATA RECORD
|Title: ||Ultra-shallow junction process development for the 45nm CMOS technology node using co-implantation|
|Authors: ||Collart, E.J.H|
|Issue Date: ||2004 |
|Conference: ||15th International Conference on Ion Implantation Technology date:24/10/04|
|Publication status: ||published|
|KU Leuven publication type: ||DI|
|Appears in Collections:||Electrical Engineering - miscellaneous|
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