Title: The influence of Ti capping layers on CoSi2 formation
Authors: Detavernier, C ×
Van Meirhaeghe, R. L
Cardon, F
Donaton, R. A
Maex, Karen #
Issue Date: 2000
Series Title: Microelectronic Engineering vol:50 issue:01/04/07 pages:125-132
ISSN: 0167-9317
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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