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Title: Integrations of Cu and low-k dielectrics: effect of hard mask dry etch and post-CMP clean on electrical performance of damascene structures
Authors: Donaton, R. A
Coenegrachts, Bart
Maenhoudt, Mireille
Pollentier, Ivan
Struyf, Herbert
Vanhaelemeersch, Serge
Grillaert, Joost
Fyen, Wim
Beyer, Gerald
Stucchi, Michele
Richard, Emmanuel
Vervoort, Iwan
De Roest, David
Maex, Karen
Issue Date: 2000
Conference: Materials for Advanced Metallization Conference - MAM; February 28 - March 1, 2000; Stresa, Italy.
Publication status: published
KU Leuven publication type: DI
Appears in Collections:Electrical Engineering - miscellaneous
Associated Section of ESAT - INSYS, Integrated Systems

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