ITEM METADATA RECORD
Title: Scalability of the Si1-xGex source/drain technology for the 45nm technology node and beyond
Authors: Eneman, Geert ×
Verheyen, Peter
Rooyackers, Rita
Nouri, Faran
Washington, Lori
Schreutelkamp, Rob
Moroz, Victor
Smith, Lee
De Keersgieter, An
Jurczak, Malgorzata
De Meyer, Christina #
Issue Date: 2006
Series Title: IEEE Transactions on Electron Devices vol:53 issue:7 pages:1647-1656
ISSN: 0018-9383
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy

 




All items in Lirias are protected by copyright, with all rights reserved.

© Web of science