Title: Cleaning, rinsing and drying effects in post-Cu CMP clean
Authors: Fyen, Wim ×
Vos, Rita
Teerlinck, Ivo
Vrancken, Evi
Grillaert, Joost
Meuris, Marc
Mertens, Paul
Heyns, Marc #
Issue Date: 2000
Host Document: pages:507
Conference: Proceedings CMP for ULSI Multilevel Interconnection Conference (CMP-MIC); 2-3 March 2000; Santa Clara, Ca, USA. location:Leuven Belgium
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Clinical Residents Medicine
Surface and Interface Engineered Materials
× corresponding author
# (joint) last author

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