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Title: A finite element study of process induced stress in the transistor channel: effects of silicide contact and gate stack
Authors: Torregiani, Cristina ×
Liu, Joy
Vandevelde, Bart
Degryse, Dominiek
Van Dal, Mark
Benedetti, Alessandro
Lauwers, Anne
Maex, Karen #
Issue Date: 2004
Publisher: IEEE
Conference: EuroSimE: 5th Int. Conf. on Thermal & Mechanical Simulation and Experiments in Micro-Electronics and Micro-Systems location:Brussels Belgium date:09/05/04
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Electrical Engineering - miscellaneous
Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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