Title: Defect generation in high-k gate dielectric stacks under electrical stress: the impact of hydrogen
Authors: Houssa, Michel
Heyns, Marc
Stesmans, Andre #
Issue Date: 2004
Conference: CECAM Workshop on Atomic Processes at Semiconductor-Oxide Interfaces in Microelectronics Devices location:Leuven Belgium date:13/09/04
Publication status: published
KU Leuven publication type: IMa
Appears in Collections:Semiconductor Physics Section
Department of Materials Engineering - miscellaneous
Surface and Interface Engineered Materials
# (joint) last author

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