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Title: High-k materials for tunnel barrier engineering in future memory technologies
Authors: Blomme, Pieter ×
Govoreanu, Bogdan
Rosmeulen, Maarten
Akheyar, Amal
Haspeslagh, Luc
De Vos, Joeri
Lorenzini, Martino
Van Houdt, Jan
De Meyer, Christina #
Issue Date: Oct-2004
Publisher: ECS
Host Document: pages:868
Conference: Extended Abstracts 206th Electrochemical Society Meeting location:Leuven Belgium date:03/10/04
Publication status: published
KU Leuven publication type: IMa
Appears in Collections:Electrical Engineering - miscellaneous
× corresponding author
# (joint) last author

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