|ITEM METADATA RECORD
|Title: ||Impact of the barrier/dielectric interface quality on reliability of Cu porous-low-k interconnects|
|Authors: ||Tokei, Zsolt ×|
Maex, Karen #
|Issue Date: ||2004 |
|Conference: ||Proceedings IEEE International Reliability Physics Symposium - IRPS location:Phoenix, AZ, USA date:27/04/04|
|Publication status: ||published|
|KU Leuven publication type: ||IC|
|Appears in Collections:||Associated Section of ESAT - INSYS, Integrated Systems|
× corresponding author|
# (joint) last author|
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