ITEM METADATA RECORD
Title: Role of dielectric and barrier integrity in reliability of sub-100nm copper low-k interconnect
Authors: Tokei, Zsolt ×
Van Aelst, Joke
Waldfried, C
Escorcia, O
Roussel, Philippe
Richard, Olivier
Travaly, Youssef
Beyer, Gerald
Maex, Karen #
Issue Date: 2005
Publisher: IEEE
Conference: 43rd Annual IEEE International Reliability Physics Symposium Proceedings location:San Jose, CA, USA date:17/04/05
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy

 




All items in Lirias are protected by copyright, with all rights reserved.