|ITEM METADATA RECORD
|Title: ||Role of dielectric and barrier integrity in reliability of sub-100nm copper low-k interconnect|
|Authors: ||Tokei, Zsolt ×|
Van Aelst, Joke
Maex, Karen #
|Issue Date: ||2005 |
|Conference: ||43rd Annual IEEE International Reliability Physics Symposium Proceedings location:San Jose, CA, USA date:17/04/05|
|Publication status: ||published|
|KU Leuven publication type: ||IC|
|Appears in Collections:||Associated Section of ESAT - INSYS, Integrated Systems|
× corresponding author|
# (joint) last author|
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