Title: The influence of oxygen on the Hf signal intensity in the characterization of HfO2/Si stacks
Authors: Huyghebaert, Cedric ×
Conard, Thierry
Vandervorst, Wilfried #
Issue Date: 2004
Series Title: Applied Surface Science vol:231-232 pages:552-555
ISSN: 0169-4332
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Nuclear and Radiation Physics Section
Electrical Engineering - miscellaneous
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.

© Web of science